Basic Information

Name: Manganese

Symbol: Mn

Atomic Number: 25

Atomic Mass: 54.93805 amu

Melting Point: 1245.0 °C (1518.15 °K, 2273.0 °F)

Boiling Point: 1962.0 °C (2235.15 °K, 3563.6 °F)

Number of Protons/Electrons: 25

Number of Neutrons: 30

Classification: Transition Metal

Crystal Structure: Cubic

Density @ 293 K: 7.43 g/cm3

Color: silverish/grayish

Name

Sign

Purity

 Shape 

Manganese

Mn

99.7%

Ingot, Sputtering Targets, Disk, Plate, Sheet

Name

Sign

Purity

 Shape 

Aluminum Manganese Alloy

AlMn 90/10, 80/20, 75/25

AlMn

Ingots,Splatters

Aluminum Manganese Alloy

AlMn 70/30, 40/60

AlMn

Ingots,Splatters

Bismuth Manganese Alloy

BiMn 80/20

Bi-Mn

powder

Copper Manganese Alloy

CuMn 80/20, 75/25

Cu-Mn

Ingots

Copper Manganese Alloy

CuMn 70/30, 50/50

Cu-Mn

Ingots

Iron Silicon Manganese Aluminum  Alloy

FeSiMnAl 40/20/20/20

FeSiMnAl

Lumps

Nickel Manganese Alloy

NiMn 40/60

Ni-Mn

Ingots

Silicon Manganese Alloy

SiMn

Custom-made

powders

Tellurium Manganese Alloy

TeMn 70/30

Te-Mn

powder

Name

Sign

Purity

 Shape 

Manganese Boride

MnB

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Boride

MnB2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Carbide

Mn3C

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Silicide

MnSi2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Nitride

MnN

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Phosphide

MnP

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Phosphide

MnP2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Phosphide

MnP3

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Phosphide

Mn3P2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Antimonide

MnSb

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Antimonide

Mn2Sb

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Antimonide

Mn3Sb2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Oxide

MnO

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Oxide

Mn3O4

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Oxide

MnO2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Oxide

Mn2O3

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Oxide

Mn2O7

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Sulfide

MnS

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Sulfide

MnS2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Selenide

MnSe

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Selenide

MnSe2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Telluride

MnTe

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Telluride

MnTe2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Fluoride

MnF2

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule

Manganese Fluoride

MnF3

99.5%

powders(40-300mesh), sputtering target, evaporation material, granule